目录
中文摘要............................................................ 1 英文摘要............................................................ 2 1 绪论............................................................. 3 2 国内外研究文献综述............................................... 5
2.1 TiO2的结构 .................................................. 5 2.2 TiO2薄膜亲水性原理 .......................................... 5 2.3 相关参数对TiO2薄膜结构及其性能的影响 ........................ 6
2.3.1 晶粒尺寸............................................... 6 2.3.2 结晶度和晶格缺陷....................................... 6 2.3.3表面积和表面预处理 ..................................... 6 2.3.4 表面羟基............................................... 6 2.3.5 薄膜厚度............................................... 7
3 实验部分......................................................... 8
3.1 实验系统介绍 ................................................ 8 3.2 衬底的选择及清洗 ............................................ 9 3.3 直流磁控溅射制备TiO2薄膜的实验步骤 .......................... 9 3.4 亲水性测试 .................................................. 9 4 实验结果及参数讨论.............................................. 10
4.1 氧流量对TiO2薄膜的工作曲线的影响 ........................... 10 4.2 溅射功率的选择及其对薄膜的性能影响 ......................... 11 4.3 总气压对薄膜性能的影响 ..................................... 13 4.4 氧氩比对薄膜亲水性的影响 ................................... 13 4.5 基片温度对薄膜性能的影响 ................................... 14 4.6 热处理对薄膜性能的影响 ..................................... 16 结论............................................................... 18 谢辞............................................................... 19 参考文献........................................................... 20
直流磁控溅射法制备TiO2薄膜
摘 要：本文利用直流磁控溅射法在不同条件下制备玻璃基TiO2薄膜样品，并
检测了薄膜的超亲水性。研究了沉积条件例如溅射总气压，氧气和氩气的相对分压，溅射功率，基片温度和后续热处理对TiO2薄膜最佳性能的影响。实验结果显示：在较低温度下沉积的TiO2薄膜是无定型且亲水性较差。相反，在4000C到5000C范围内退火过后，薄膜表面呈现超亲水性能。本文在实验中获得的最佳制备条件为：溅射功率为 94 W，溅射气压在2.0Pa，氧氩比是2:30，基片温度为400 0C，最后在空气气氛中退火，温度为4500C。
关键词：直流磁控溅射；TiO2薄膜；超亲水性；退火温度
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Preparing TiO2 Films by DC Reactive Magnetron Sputtering
Abstract: In this paper TiO2 films are deposited on the glass substrates by DC
reactive magnetron sputtering at different conditions. Super hydrop-hilicity of TiO2 thin film has been examined.The influences of the deposition such as the total sputtering gas pressure，their relative oxygen and argon partial pressure,sputtering power,substrate temper-atrue and post-annealing temperature on the optimum performance of the TiO2 thin film are studied. The results showed that the TiO2
thin
film sputtered at low temperature is amporphous and has a
rather poor hydrophilicity.In contrast,annealed at a temperature ran-ging from 400 0C to 500 0C,super hydrophilicity of the anataseph-ased TiO2 film can be observed.The best conditions obtained are that sputtering power is 94 W,sputtering pressure is 2.0 Pa,oxygenargon ratio is 2:30,substrate temperature is 400 0C and annealing temperature in air atmosphere is 450 0C.
keywords:reactive magnetron sputtering;TiO2 thin film;super hydrophilicity; annealing temperature
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